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	Understanding Key Molecular Properties in a CVD Process Feasibility Study: Design of Volatile Non-halogenated Precursors for the Chemical Vapor Deposition (CVD) of Copper 0.00 avg rating — 0 ratings — published 2002	Error rating book. Refresh and try again. Rate this book Clear rating 1 of 5 stars 2 of 5 stars 3 of 5 stars 4 of 5 stars 5 of 5 stars
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