High Dielectric Constant Materials: VLSI MOSFET Applications

by Howard R. Huff (Editor)

Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology.

734 pages, Hardcover

First published January 1, 2004