Plasma Etching: An Introduction

by Dennis M. Manos (Editor), Daniel L. Flamm (Editor)

Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.

476 pages, Hardcover

First published January 1, 1989